C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 487/04 (2006.01) A61K 31/495 (2006.01) A61K 31/4985 (2006.01) A61K 31/519 (2006.01) A61P 1/00 (2006.01) A61P 9/10 (2006.01) A61P 11/00 (2006.01) A61P 17/00 (2006.01) A61P 27/14 (2006.01) A61P 27/16 (2006.01) A61P 29/00 (2006.01) A61P 43/00 (2006.01) C07D 209/00 (2006.01) C07D 241/00 (2006.01)
Patent
CA 2326522
Formula (I), wherein R1 is -(L1)-R6 wherein L1 is a divalent linking group of 1 to 18 atoms or the like, and R6 is a carbocyclic ring substituted by at least one non-interfering substituent or the like; R2 is C1 to C3 alkyl, C3 to C4 cycloalkyl or the like group; R3 is -(L2)-(acidic group); R4 and R5 are hydrogen atoms, non-interfering substituents, carbocyclic groups or the like; RA is -C(=X)-C(=X)-NH2 or the like; and X is independently oxygen atom or sulfur atom; the prodrugs thereof, their pharmaceutically acceptable salts, or their solvates, and a composition for inhibiting sPLA2 containing them as effective ingredients.
L'invention concerne un composé de la formule (I) dans laquelle R?1¿ est -(L?1¿)-R?6¿ (L?1¿ étant un groupe de liaison bivalent de 1 à 18 atomes ou autres; et R?6¿ étant un noyau carbocyclique substitué par au moins un substituant passif ou autre); R?2¿ est un groupe alkyle C1-C3, cycloalkyle C3-C4 ou autre; R?3¿ est -(L?2¿)-(groupe acide); R?4¿ et R?5¿ sont des atomes d'hydrogène, des substituants passifs, des groupes carbocycliques ou autres; R?A¿ est -C(=X)-C(=X)-NH¿2? ou autre; et X est indépendamment un atome d'oxygène ou un atome de soufre. L'invention concerne en outre des promédicaments obtenus à partir dudit composé, leurs sels pharmaceutiquement acceptables ou leurs solvats, et une composition les contenant en tant que principes actifs et pouvant inhiber sPLA¿2?.
Fuji Masahiro
Ohtani Mitsuaki
Okada Tetsuo
Mccarthy Tetrault Llp
Shionogi & Co. Ltd.
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