C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/306, 260/326
C07D 207/50 (2006.01) C07D 403/02 (2006.01) C07D 487/04 (2006.01)
Patent
CA 1262904
ABSTRACT The invention relates to compounds having the general formula II Image (II) where R is hydrogen, loweralkyl, loweralkylaminoloweralkyl or diloweralkylaminloweralkyl, X is hydrogen, halogen, lower alkyl triflouromethyl or nitro; Y is hydrogen, halogen or loweralkyl; and R1 is hydrogen Image , Image Image or Image and processes for preparing the compounds. Many of the compounds of the formula II are useful as intermediates for synthesizing compounds of the formula I Image (I) where R, X and Y are defined above. Compounds of the formulae I and II are useful as analgesic, anxiolytic and/or anticonvulsant agents. The invention also relates to compounds of the formula III Image III wherein X and Y are as defined above and processes for preparing the compounds. Compounds of the formula III are useful as intermediates for synthesizing compounds of the formulae I and II.
574704
Effland Richard C.
Hamer R. Richard L.
Klein Joseph T.
Bereskin & Parr
Effland Richard C.
Hamer R. Richard L.
Hoechst-Roussel Pharmaceuticals Inc.
Klein Joseph T.
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