C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 487/04 (2006.01) A61K 31/50 (2006.01) A61K 31/535 (2006.01)
Patent
CA 2332528
Compounds having sPLA2 inhibitory effect represented by general formula (I), prodrugs thereof, pharmaceutically acceptable salts thereof or solvates of the same, and sPLA2 inhibitors containing the same as the active ingredient, wherein R1 represents -(L1)-R6 (wherein L1 represents a divalent linking group having 1 to 18 atoms, etc.; and R6 represents a carbon ring having one or more non-interfering substituents, etc.); R2 represents C1-3 alkyl, etc.; R3 represents -(L2)-(acidic group); R4 and R5 represent each hydrogen, a non- interfering substituent, a carbon ring, etc.; Xs independently represent each oxygen or sulfur; and RA represents -C(=X)-C(=X)-NH2, etc.
L'invention porte sur des composés à effet inhibiteur sur le sPLA¿2?, leurs précurseurs, leurs sels et solvates pharmacocompatibles, et sur des inhibiteurs du sPLA¿2? dont ils constituent le principe actif. Dans la formule (I), R?1¿ représente -(L?1¿)-R?6¿ (L?1¿ étant un groupe de liaison divalent à 1 à 8 atomes, etc. et R?6¿ un cycle carbone à un ou plusieurs substituants non interférants, etc.); R?2¿ représente C¿1-3? alkyle, etc.; R?3¿ représente -L?2¿-(groupe acide); R?4¿ et R?5¿ représentent chacun H, un substituant non interférant, un cycle carbone, etc.; les X représentent indépendamment chacun O ou S, et R?A¿ représente -C(=X)-C(=X)-NH¿2?, etc.
Adachi Makoto
Fuji Masahiro
Fukui Yoshikazu
Ohtani Mitsuaki
Mccarthy Tetrault Llp
Shionogi & Co. Ltd.
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