C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/125, 167/211
C07D 471/06 (2006.01) A61K 31/47 (2006.01) A61K 31/535 (2006.01) A61K 31/54 (2006.01) C07D 498/06 (2006.01) C07D 513/06 (2006.01) C07F 7/10 (2006.01) C07F 7/18 (2006.01)
Patent
CA 2023726
ABSTRACT Compounds of the formula: Image in which R1 and R2 are each hydrogen or lower alkyl, R3 is aryl or heterocyclic group, each of which may be substituted by suitable substituent(s), R4 is hydrogen, halogen or lower alkyl, A is methylene, methine, oxa, thia, sulfinyl or sulfonyl, Y is vinylene or ethylene, Z is a group of the formula: Image or Image wherein R5 is carboxy or protected carboxy, and R6 is hydrogen or hydroxy-protective group, and the line of ---- is a single or double bond, and pharmaceutically acceptable salts thereof. A process for the preparation of these compounds, pharma- ceutical compositions containing them and the prepara- tion thereof, and their uses for treating hyper- cholesterolemic and hyperlipoproteinemic states and associated conditions are also disclosed. These compounds and salts are for example useful for treating atherosclerosis, angina, myocardial infarction, cerebral vacular occlusion, arterial aneurism, peripheral vacular disease, recurrent pancreatitis, xanthomas, diabetic nephropathy, and the like.
Fujii Naoaki
Manabe Takashi
Matsuda Hiroshi
Matsuo Masaaki
Okumura Hiroyuki
Fujii Naoaki
Fujisawa Pharmaceutical Co. Ltd.
Manabe Takashi
Matsuda Hiroshi
Matsuo Masaaki
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