H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/192, 327/34
H01L 21/00 (2006.01) H01J 37/18 (2006.01) H01J 37/20 (2006.01) H01L 21/677 (2006.01)
Patent
CA 1283174
ABSTRACT Plural plasma etching vessels and a wafer queuing station are arrayed with a wafer transfer arm in a controlled environment. Wafer processing in each vessel is regulated by a state controller for processing a plurality of wafers from a single cassette, contained within the vacuum environment of the plural plasma etching vessels and wafer queuing station, to provide an orderly and efficient throughput of wafers for diverse or similar processing in the plural vessels. In this manner a wafer can be processed as soon as a vessel becomes available.
548598
Maher Joseph A.
Miller Mark W.
Napoli Joseph D.
Vowles E. John
Zafiropoulo Arthur W.
Applied Materials Inc.
Borden Ladner Gervais Llp
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