Quadrupole r.f. sputtering system having an anode/cathode...

Details Quadrupole r.f. sputtering system having an anode/cathode... Quadrupole r.f. sputtering system having an anode/cathode...

H - Electricity

01

J

204/167

H01J 37/34 (2006.01)

Patent

CA 1163602

A Quadrupole R.F. Sputtering System Having An Anode/Cathode Shield And A Floating Target Shield Abstract A quadrupole sputtering system having four electrodes comprised of a cathode, an anode, a cathode/anode shield and an electrically floating target shield circumscribing the source target of the cathode. FI9-81-041

404044

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