C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/504, 400/709
C07D 295/088 (2006.01) C03C 25/24 (2006.01) C07C 215/40 (2006.01) C07C 217/50 (2006.01) C07C 309/04 (2006.01) C07C 309/31 (2006.01) C08K 5/19 (2006.01) C08K 5/42 (2006.01) C09K 3/16 (2006.01) D06M 13/463 (2006.01)
Patent
CA 2001561
ABSTRACT OF THE DISCLOSURE Quaternary ammonium compounds are disclosed which are represented by the graphic formula: Image wherein R is a C2-C22 alkyl, R1 is selected from the group consisting of C1-C22 alkyl and an alkyleneoxy radical represented by the formula [-CH2-C(A)H-O]XH, R2 is selected from the group consisting of C1-C3 alkyl, and the alkyleneoxy radical, [-CH2-C(A)H-O]xH, or R2 may join together with R1 to form a morpholino group, R3 is an alkyleneoxy radical represented by the formula [-CH2-C(A)H-O]xH, Rb is a C8-C18 alkyl, A is selected from the group consisting of hydrogen, methyl and ethyl, and x is an integer of from 1 to 5. These compounds are useful as antistatic agents for synthetic polymer articles.
Borden Ladner Gervais Llp
Govindan Cheruthur
Ppg Industries Inc.
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