C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 401/14 (2006.01) A61K 31/505 (2006.01) A61K 31/53 (2006.01) A61K 31/535 (2006.01) C07D 401/06 (2006.01) C07D 405/14 (2006.01) C07D 413/14 (2006.01) C07D 487/04 (2006.01)
Patent
CA 2117075
2117075 9305035 PCTABS00020 A compound of formula (I) in which R1 is substituted heterocyclic-(lower)alkyl, and R2 is hydrogen, halogen, nitro, amino, protected amino, hydroxyamino, lower alkyl, hydroxy, protected hydroxy, sulfamoyl, carboxy, protected carboxy, mercapto, optionally substituted heterocyclic-carbonyl, optionally substituted heterocyclic-(lower)alkyl, lower alkylthio, hydroxy(lower)alkyl or protected hydroxy(lower)alkyl, R3 is aryl which may have suitable substituent(s), and A is lower alkylene, or pharmaceutically acceptable salts thereof, useful as a dopamine receptor agonist, 5-HT receptor antagonist or .alpha.1 receptor antagonist.
Hashimoto Masashi
Itoh Yoshikuni
Shimazaki Norihiko
Tanaka Hirokazu
Yamazaki Hitoshi
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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