C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 401/04 (2006.01) A61K 31/47 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) C07D 215/56 (2006.01) C07D 413/04 (2006.01)
Patent
CA 2058424
ABSTRACTS OF THE DISCLOSURE The present invention relates to a quinolone carboxylic acid derivative represented by the following the formula (I), Image (I) wherein R1 is a lower alkyl group, R2 is a hydrogen atom or a lower alkyl group, R3 is a hydrogen atom or a halogen atom, R4 and R5 together form a five- or six-membered ring which may contain hetero atoms or may have substituents, provided that a compound wherein R1 is a methyl group, R2 and R3 are hydrogen atom and Image is a piperazinyl group is excluded; or a salt thereof; to an antimicrobial agent comprising the same as an effective component; and to an intermediate for producing same.
Asaoka Takemitsu
Katori Tatsuhiko
Kawahara Ryuichi
Kuraishi Tadayuki
Matsuda Hideaki
Gowling Lafleur Henderson Llp
Ss Pharmaceutical Co. Ltd.
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