C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 215/36 (2006.01) A61K 31/47 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) A61K 31/54 (2006.01) C07D 215/54 (2006.01) C07D 215/56 (2006.01) C07D 401/04 (2006.01) C07D 401/06 (2006.01) C07D 401/12 (2006.01) C07D 405/12 (2006.01) C07D 409/12 (2006.01) C07D 413/04 (2006.01) C07D 413/06 (2006.01) C07D 417/02 (2006.01) C07D 417/06 (2006.01) C07D 417/12 (2006.01) C07D 471/06 (2006.01)
Patent
CA 2108971
2108971 9218483 PCTABS00016 Quinoline derivatives of formula (I), wherein R1 is lower alkyl or aryl which may have suitable substituent(s), R2 is hydroxy, protected hydroxy, lower alkoxy, etc., R3 is hydrogen, lower alkyl, lower alkoxy(lower)- alkyl or ar(lower)alkyl and R8 is hydrogen, or R3 and R8 are linked together to form lower alkylene, R4 is an organic group, Z is O or S, and n is 0, 1 or 2; and pharmaceutically acceptable salts thereof which are useful as a medicament.
Matsuo Masaaki
Nakamura Katsuya
Spears Glen W.
Tsuji Kiyoshi
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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