C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/208, 260/243
C07D 513/00 (2006.01) A61K 31/47 (2006.01) A61K 31/54 (2006.01)
Patent
CA 1259988
ABSTRACT OF THE DISCLOSURE A compound of the formula Image (I) R1 is hydrogen, alkali metal, alkaline earth metal, lower alkyl, pivaloyloxymethyl or phthalidyl; R2, R3, R4 and R5 are the same or different and are hydrogen, halogen, lower alkoxy or Image . wherein R6 and R7 are lower alkyl or R6 and R7 together with the nitrogen atom to which they are attached form a five- to seven- membered unsubstituted or sub- stituted heterocyclic ring containing said nitrogen atom as the sole hetero atom or containing nitrogen, sulfur or oxygen as additional hetereo atoms; A is a saturated or unsaturated hydrocarbon chain of one to five carbon atoms, unsubstituted or substituted by lower alkyl; lower alkoxy; lower alkyl- thio, hydroxy; halogen; lower alkyl substituted by halogen, amino, loweralkoxycarbonyl, carboxy, lower- alkoxy, loweralkylthio, loweracyloxy or hydroxy; loweralkylamino; carboxy; nitro; cyano; carbonyl; imino; or by substituted or unsubstituted phenyl, phenylthio, phenylamino or phenoxy; and R2 and R3 or R3 and R4 or R4 and R5 to- gether may be alkylenedioxy of 1 to 5 carbon atoms which form a ring with the carbon atoms to which they are attached; or a pharmaceutically acceptable salt thereof.
434945
Enomoto Hiroshi
Kise Masahiro
Kitano Masahiko
Morita Iwao
Ozaki Masakuni
Nippon Shinyaku Co. Ltd.
Osler Hoskin & Harcourt Llp
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