C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 513/16 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) C07D 519/00 (2006.01) C07F 5/02 (2006.01)
Patent
CA 2043104
- 119 - Abstract of the Disclosure: Novel quinolinecarboxylic acid derivatives of the formula: Image wherein Z is Image or Image in which R1 is hydrogen atom, a halogen atom, hydroxy or a lower alkyloxy; R2 is a halogen atom, hydroxy or a lower alkyloxy; R3 is a lower alkyl; and R4 is hydroxy or a di(lower alkyl)amino, and a pharmaceutically acceptable salt thereof, which have excellent antibacterial activities and are useful as an antibacterial agent, a pharmaceutical composition containing the same, and process for preparing the same.
Inoue Yoshimasa
Jinbo Yoshikazu
Kondo Hirosato
Kotera Yasuo
Sakamoto Fumio
Inoue Yoshimasa
Jinbo Yoshikazu
Kanebo Ltd.
Kirby Eades Gale Baker
Kondo Hirosato
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