C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/281.5
C07D 215/02 (2006.01) C07D 215/06 (2006.01) C07D 215/08 (2006.01) C07D 215/12 (2006.01) C07D 215/18 (2006.01) C07D 215/233 (2006.01)
Patent
CA 1192198
Abstract: The invention provides novel quinolylacetic acid compounds of the general formula (I): Image (I) wherein R1 is a hydrogen atom or a lower alkyl group (which may optionally be substituted with aromatic group optionally having a substituent), R2 is a hydrogen atom or a lower alkyl group, R3 is a hydrogen atom, a halogen atom or an alkyl or alkenyl group, each of R4 and R5 is a hydrogen atom or a lower alkyl group (which may optionally form a ring by cyclization of R4 and R5), R6 is a hydrogen atom or an alkyl, alkenyl, alkynyl group, an aralkyl or acyl group which may optionally have a substituent, A is a hydrogen atom or an oxo group, when A is a hydrogen atom, the broken line represents a single or double bond, when A is an oxo group, the broken line represents a single bond, and compounds that are pharmaceutically acceptable salts thereof. These compounds are effective anti-inflammatory, analgesic and antipyretic agents.
418496
Hamada Masaaki
Kurosaki Teikichi
Okamoto Kaoru
Kirby Eades Gale Baker
Nippon Zoki Pharmaceutical Co. Ltd.
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