C - Chemistry – Metallurgy – 09 – D
Patent
C - Chemistry, Metallurgy
09
D
C09D 4/02 (2006.01) C08J 5/18 (2006.01) C08J 7/04 (2006.01) C09D 11/10 (2006.01) G03F 7/027 (2006.01) C09D 151/08 (2006.01)
Patent
CA 2511790
A method for producing a solvent resistant, low-extractable, film from an actinic radiation curable homogenous aqueous composition containing a water soluble compound, having at least one alpha, beta-ethylenically unsaturated radiation polymerizable double bond, and water as essential components.
L'invention concerne une méthode de production d'un film résistant au solvant, à faible taux d'extraction, à partir d'une composition aqueuse actinique homogène polymérisable par rayonnement contenant un composé soluble dans l'eau et présentant au moins une double liaison alpha, bêta-éthyléniquement insaturée, polymérisable par rayonnement, et de l'eau, en tant qu'éléments essentiels.
Biro David
Chatterjee Subhankar
Laksin Mikhail
Turgis Jean Dominique
Mccarthy Tetrault Llp
Sun Chemical Corporation
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