Radiation mask structure

Details Radiation mask structure Radiation mask structure

G - Physics

03

F

31/115, 358/24

G03F 1/00 (2006.01) G03F 1/14 (2006.01) H01L 21/467 (2006.01)

Patent

CA 1129635

Adams-4 11 RADIATION MASK STRUCTURE Abstract of the Disclosure The discovery that boron nitride and boron carbide films can be made in tension allows nondistorting radiation windows or masks to be realized. Both low and high pressure techniques for making the tensile films lead to related mask structures utilizing such films. The resulting structures are sufficiently distortion free to be useful for x-ray lithography.

335415

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