G - Physics – 03 – F
Patent
G - Physics
03
F
31/115, 358/24
G03F 1/00 (2006.01) G03F 1/14 (2006.01) H01L 21/467 (2006.01)
Patent
CA 1129635
Adams-4 11 RADIATION MASK STRUCTURE Abstract of the Disclosure The discovery that boron nitride and boron carbide films can be made in tension allows nondistorting radiation windows or masks to be realized. Both low and high pressure techniques for making the tensile films lead to related mask structures utilizing such films. The resulting structures are sufficiently distortion free to be useful for x-ray lithography.
335415
Adams Arthur C.
Capio Cesar D.
Levinstein Hyman J.
Sinha Ashok K.
Wang David N.
Kirby Eades Gale Baker
Western Electric Company Incorporated
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