G - Physics – 03 – F
Patent
G - Physics
03
F
96/179, 400/5153
G03F 7/033 (2006.01) C08F 2/44 (2006.01) C08F 2/48 (2006.01)
Patent
CA 1335914
Radiation-polymerizable composition which comprises a) a constituent that can be polymerized by free radicals and has a boiling point above 100°C, b) a photoinitiator, and c) a copolymer comprising units of c1) an .alpha., .beta.-unsaturated aliphatic carboxylic acid, c2) an alkyl, cycloalkyl or cycloalkenyl methacrylate, and c3) an alkyl, cycloalkyl or cycloalkenyl acrylate and has an acid number of 78 to 176 and a glass transition temperature of 290 to 340 K. The composi- tion is characterized by its ready developability at a low acid number and its good resistance to alkaline etching solutions.
591049
Geissler Ulrich
Wiezer Hartmut
Eternal Technology Corporation
Fetherstonhaugh & Co.
Geissler Ulrich
Wiezer Hartmut
LandOfFree
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