Radiation-resistant high molecular composition

Details Radiation-resistant high molecular composition Radiation-resistant high molecular composition

C - Chemistry, Metallurgy

08

K

400/1113, 400/50

C08K 5/03 (2006.01) C08K 3/00 (2006.01) C08K 5/06 (2006.01) H01B 3/30 (2006.01)

Patent

CA 1290479

APR 25 91 13:42 SCOTT & AYLEN OTTAWA P.2 SPECIFICATION TITLE OF THE INVENTION Radiation-resistant high molecular composition ABSTRACT A radiation-resistant high molecular composition is disclosed, characterized in that, to the high molecular polymer, a halogenated acenaphtylene and/or condensates thereof represented by a following general formula [I] Image [I] (wherein, X indicates a chlorine or bromine atom, a indicates 0 to 2, b indicates 1 to 6 and n indicates an integer not less than 1) and a diphenyl ether derivative represented by a follow- ing general formula [II] Image [II] (wherein, R1 and R2 indicate any ones of hydrogen atom, alkyl, alkoxy, phenyl phenoxy, diphenyloxy and terphenyloxy group) and/ or basic lead compound are formulated.

547414

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