G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/039 (2006.01) G03F 7/038 (2006.01)
Patent
CA 2044541
RADIATION-SENSITIVE COMPOSITION CONTAINING A VINYL PYRROLIDONE POLYMER AND USE THEREOF IN LITHOGRAPHIC PRINTING PLATES ABSTRACT Radiation-sensitive compositions which are especially useful in the production of negative-working lithographic printing plates comprise a photocrosslinkable polymer containing the photosensitive group -CH=CH-?- as an integral part of the polymer backbone and, in an amount sufficient to improve the properties of the composition, a polymer of vinyl pyrrolidone. The polymer of vinyl pyrrolidone improves the properties of the radiation-sensitive composition in regard to such factors as shelf life, image contrast, and developability and thereby provides a superior lithographic printing plate. In a preferred embodiment of the invention, the radiation-sensitive composition also contains a copolyester of an unsaturated dicarboxylic acid and an oxyalkylene ether of an alkylidene diphenol. The aforesaid copolyester provides the further advantage of greatly enhanced ink receptivity.
Josephson Paul Richard Jr.
Miller Gary Roger
Mitchell James Edward
Ryan Raymond William Jr.
West Paul Richard
Eastman Kodak Company
Gowling Lafleur Henderson Llp
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