Radiation-sensitive compounds

Details Radiation-sensitive compounds Radiation-sensitive compounds

G - Physics

03

F

260/179

G03F 7/016 (2006.01)

Patent

CA 1154759

IMPROVEMENTS IN OR RELATING TO RADIATION SENSITIVE COMPOUNDS ABSTRACT OF THE DISCLOSURE A radiation sensitive compound contains at least two groups having the structure A N2+ - Ar - R - X - ? - X'- in which Ar represents a divalent or other polyvalent radical derived from an aromatic or heteroaromatic compound; X and X' which may be the same or different, each represents O, S or an imino group, provided that at least one of X and X' is an imino group; Y represents O or S; R represents a single bond or a divalent or other polyvalent radical and A- is an anion. Radiation sensitive compositions comprising the compound and optionally a resin may be used to produce radiation sensitive plates for lithographic printing plate production.

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