C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
96/165, 260/169,
C07D 251/12 (2006.01) C07D 251/18 (2006.01) C07D 251/22 (2006.01) C09B 29/40 (2006.01) G03F 7/029 (2006.01) G03F 7/105 (2006.01) G03G 5/09 (2006.01)
Patent
CA 1304354
ABSTRACT A radiation sensitive compound is a trimer of Image or has the formula Image wherein R1 and R2, are alkyl, aryl, X, CHX2, CH2X, CX3 or NHR3 wherein R3 represents hydrogen, lower alkyl, aryl or ? A2, R4 represents NCO or R2 provided that R3 is not ? - A2, and provided at least one of R1, and R2 and R4 is CX3, X is halogen, and A1 and A2 are each residues of A1-H and A2-H respectively wherein A1-H and A2-H are each compounds containing at least one group having an active hydrogen atom. The compounds are useful as initiators and colour change indicators in radiation sensitive compositions for lithographic printing plate production.
575894
Kolodziejczyk Victor
White Nicholas John
E. I. Du Pont de Nemours And Company
Mccarthy Tetrault Llp
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