Radiation-sensitive ester and process for its preparation

Details Radiation-sensitive ester and process for its preparation Radiation-sensitive ester and process for its preparation

C - Chemistry, Metallurgy

07

C

C07C 309/76 (2006.01) C07C 309/71 (2006.01) C07C 311/16 (2006.01) C07C 317/32 (2006.01) C07C 323/66 (2006.01) G02F 1/065 (2006.01) G03F 7/022 (2006.01)

Patent

CA 2065475

Abstract of the Disclosure The invention relates to a radiation-sensitive ester which is the condensation product of (a) a compound containing 2 to 6 aromatic hydroxyl groups, (b) a ring- substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (compound D1) and (c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (compound D2) and/or a non-radiation-sensitive organic acid (compound D0), where the (b):(c) molar ratio is between 0.1:1 and 39:1.

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