Radiation-sensitive, ethylenically unsaturated,...

C - Chemistry – Metallurgy – 07 – C

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

260/470

C07C 271/32 (2006.01) C07C 267/00 (2006.01) C07C 271/48 (2006.01) C07C 271/54 (2006.01) C08F 20/36 (2006.01)

Patent

CA 1340884

The ethylenically unsaturated organic compounds are of the general formula (see above formula) where R is alkyl, aryl or a radical R1, and R1 is a radical (see above formula) where R2 to R6 are each H, alkyl, OH, Oalkyl, SH, Salkyl, halogen, N(alkyl)2 or N(alkyl)(aryl), and not less than one but not more than three of the radicals R2 to R6 are each a radical (see above formula) where X is alkylene or oxaalkylene, each of 2 to 10 carbon atoms, and Y is H or CH3. These compounds have particularly high photochemical reactivity in the medium-wavelength to relatively long-wavelength UV range.

602428

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Radiation-sensitive, ethylenically unsaturated,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation-sensitive, ethylenically unsaturated,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive, ethylenically unsaturated,... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1328844

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.