Radiation sensitive material

Details Radiation sensitive material Radiation sensitive material

C - Chemistry, Metallurgy

08

F

402/154, 402/2

C08F 26/02 (2006.01) G03F 7/004 (2006.01) G03F 7/021 (2006.01)

Patent

CA 1326101

Improvements in or relating to radiation sensitive material ABSTRACT OF THE DISCLOSURE Radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture is based on a polymer including a plurality of structural units represented by the formula: Image in which, R represents H or CH3; each R1, which may be the same or different represents H or alkyl; R2 represents a single bond or a substituted or unsubsti- tuted divalent radical; Ar represents a substituted or unsubstituted divalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or NH; A represents an anion, Y represents a carbonyl oxy or aromatic radical; and n is an integer equal to or greater than 1.

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