Radiation-sensitive mixture

Details Radiation-sensitive mixture Radiation-sensitive mixture

G - Physics

03

F

96/172

G03F 7/039 (2006.01) G03F 7/027 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2023668

- 26 - O.Z. 0050/41050 Abstract of the Disclosure: A radiation-sensitive mixture is composed of (a) a ureido-containing reaction product, (b) at least one organic compound which contains one or more carboxyl groups, (c) at least one ethylenically monounsaturated or polyunsaturated organic compound, (d) optionally, a photoinitiator or photoinitiator system and (e) optionally, further additives and auxiliaries, wherein component (a) is a reaction product of i) at least one di- or polyisocyanate and ii) at least one organic compound having at least one primary or secondary amino group and iii) optionally, one or more compounds having at least one hydroxyl group.

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