Radiation-sensitive mixture for photosensitive coating...

G - Physics – 03 – F

Patent

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G03F 7/039 (2006.01) G03F 7/004 (2006.01) G03F 7/075 (2006.01)

Patent

CA 1332031

ABSTRACT OF THE DISCLOSURE: Disclosed is a radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility is an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

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