G - Physics – 03 – F
Patent
G - Physics
03
F
96/177
G03F 7/039 (2006.01) G03F 7/004 (2006.01) G03F 7/023 (2006.01)
Patent
CA 2035406
Abstract of the Disclosure A radiation-sensitive mixture, a radiation- sensitive recording material produced from the mixture, and a process for producing heat-resistant and chemical-resistant relief copies using the recording material are disclosed. The normally positive-working radiation-sensitive mixture contains (1) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and (2) a 1,2-quinone diazide and/or a combination of a compound which forms strong acid when exposed to actinic radiation and a compound containing at least one acid- cleavable C-O-C bond. The polymeric binder has a molecular weight of between about 5,000 and 100,000 and a content of phenolic hydroxyl groups of about 1 to 15, preferably about 2 to 10, mmol/g of polymer. It has a content of -CH3-nXn units of at least 0.1, preferably about 0.5 to 2, mmol/g of polymer, X being halogen such as chlorine, bromine or iodine and n being 1, 2 or 3. Lithographic plates are produced with the mixture which are thermally postcurable, have a high print run and have good resistance to chemicals. Photoresists having high heat resistance can also be produced with the mixture.
Elsaesser Andreas
Frass Hans W.
Mohr Dieter
Elsaesser Andreas
Fetherstonhaugh & Co.
Frass Hans W.
Hoechst Aktiengesellschaft
Mohr Dieter
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