C - Chemistry – Metallurgy – 09 – D
Patent
C - Chemistry, Metallurgy
09
D
400/5158, 204/91
C09D 5/25 (2006.01) C08F 290/14 (2006.01) C08G 73/10 (2006.01) C08L 79/08 (2006.01) G03F 7/037 (2006.01)
Patent
CA 1195039
ABSTRACT OF THE DISCLOSURE A radiation-sensitive polyimide precursor composition comprises a polymer of the formula Image wherein n is a positive integer corresponding to the number of units in the polymer and is sufficiently large to provide the polymer with a number average molecular weight of about 1500-15,000 as determined by vapor pressure osmometry, and wherein for any par- ticular unit in the polymer: denotes isomerism; R1 is a divalent aromatic, aliphatic or cycloaliphatic radical containing at least 2 carbon atoms; R2 and R3 are selected from the group consisting of a hydrogen radical and any organic radical containing a photo- polymerizable olefinic double bond; and R4 and R5 are selected from the group consisting of perfluoro and parhalofluoro aliphatic hydrocarbons having 1 to 8 carbons;
418747
E. I. Du Pont de Nemours And Company
Mccallum Brooks & Co.
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