Radiation sensitive polymeric o-nitrophenyl acetals

Details Radiation sensitive polymeric o-nitrophenyl acetals Radiation sensitive polymeric o-nitrophenyl acetals

C - Chemistry, Metallurgy

08

G

402/100, 402/102

C08G 4/00 (2006.01) C08G 63/685 (2006.01) G03F 7/00 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1049693

Abstract of the Disclosure Radiation-sensitive linear polymers comprise repeating structural units containing an o-nitrophenyl acetal. The polymer is formed, for example, by the linear polycondensation of o-nitrobenzaldehyde with a particular dihydroxy alcohol. The polymers are useful as coatings to form positive-working radiation-sensitive elements such as photoresists or lithographic printing plates.

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