Radiation-sensitive polymers

Details Radiation-sensitive polymers Radiation-sensitive polymers

G - Physics

03

F

356/176, 96/177,

G03F 7/039 (2006.01) C08F 214/16 (2006.01) C08F 228/02 (2006.01) C08F 246/00 (2006.01) G03F 7/029 (2006.01)

Patent

CA 2007765

ABSTRACT OF THE DISCLOSURE: Disclosed are radiation-sensitive polymers which contain acid-labile groups and onium salt groups with nonnucleophilic counterions in one and the same molecule. These radiations sensitive polymers are highly suitable for use as photoresists and produce the desired resist profiles without additional measures or process steps. They are therefore very advantageously suitable for fabricating semiconductor components.

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