C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
402/130, 96/155,
C08F 34/00 (2006.01) C08F 32/02 (2006.01) C08G 18/04 (2006.01) G03F 7/032 (2006.01)
Patent
CA 1061930
ABSTRACT OF THE DISCLOSURE Radiation sensitive polymers comprising: A. from about 1 to 100 mole percent of a polymerized monomer having the formula Image wherein R is a hydrocarbon group having from 2 to 20 carbon atoms, preferably a bridged hydrocarbon group having from 6 to 10 carbon atoms; and B. from 0 to about 99 mole percent of at least one additional polymerized ethylenically unsaturated monomer are advantageously soluble in organic solvents, posses desirably high glass transition temperatures and are capable of under- going a photochemical reaction to yield polymers having isocyanate and oxy-substituted cyclopropane moieties which are capable of crosslinking in the presence of active hydrogen- containing compounds. The polymers are useful in radiation sensitive compositions and elements containing same. - 1-
240652
Eastman Kodak Company
Na
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