Radiation-sensitive positive resist composition

Details Radiation-sensitive positive resist composition Radiation-sensitive positive resist composition

G - Physics

03

F

96/158

G03F 7/022 (2006.01) C08G 8/24 (2006.01) G03F 7/023 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2036812

ABSTRACT OF THE DISCLOSURE A positive resist composition comprising a 1,2- quinone diazide compound and an alkali-soluble resin which comprises a resin (I) obtainable through a condensation reaction of an aldehyde with a phenol mixture containing m- cresol and at least one selected from the group consisting of 2-tert.-butyl-4-methylphenol and 2-tert.-butyl-6-methyl- phenol, which has well balanced properties.

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