Radiation-sensitive positive resist composition

Details Radiation-sensitive positive resist composition Radiation-sensitive positive resist composition

G - Physics

03

F

96/172

G03F 7/023 (2006.01) G03F 7/022 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2024312

- 18 - ABSTRACT OF THE DISCLOSURE A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula: Image (I) wherein R is a C1-C5 alkyl group or a C1-C5 alkoxy group, and n is a number of 0 to 3, which has good sensitivity, improved resolution and heat resistance.

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