Radiation-sensitive positive resist composition

Details Radiation-sensitive positive resist composition Radiation-sensitive positive resist composition

G - Physics

03

F

96/158

G03F 7/22 (2006.01) G03F 7/004 (2006.01) G03F 7/022 (2006.01) G03F 7/38 (2006.01)

Patent

CA 2027368

- 10 - ABSTRACT OF THE DISCLOSURE A positive resist composition comprising an alkali-soluble resin, a quinonediazide compound and a sol- vent comprising 3-methoxybutyl acetate, which forms a resist film having smaller striation.

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