Radiation-sensitive positive resist composition

Details Radiation-sensitive positive resist composition Radiation-sensitive positive resist composition

G - Physics

03

F

96/158

G03F 7/021 (2006.01) G03F 7/023 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2032884

- 36 - ABSTRACT OF THE DISCLOSURE A positive resist composition comprising a 1,2- quinone diazide compound and an alkali-soluble resin which comprises a resin (I) obtainable through a condensation reaction of a phenol mixture containing m-cresol and 2- tert.-butyl-5-methylphenol with an aldehyde., which has well balances properties.

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