Radiation-sensitive positive resist composition

Details Radiation-sensitive positive resist composition Radiation-sensitive positive resist composition

G - Physics

03

F

G03F 7/038 (2006.01) C07C 39/15 (2006.01) G03F 7/022 (2006.01)

Patent

CA 2044560

- 1 - ABSTRACT The present invention is directed to a positive resist composition comprising a radiation-sensitive component, an alkali-soluble resin and a phenol compound of the formula: (I) Image wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, R' is an alkyl group or an alkoxy group, and n is a number of 0 to 3. The positive resist composition of the present invention has well balanced, good properties, e.g. sensitivity, resolution, heat resistance and adhesiveness.

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