Radiation sensitive refractive index changing composition...

G - Physics – 03 – F

Patent

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G03F 7/004 (2006.01) C08L 67/00 (2006.01) C08L 69/00 (2006.01) C08L 83/14 (2006.01) C08L 101/00 (2006.01) G02B 1/04 (2006.01) G02B 3/00 (2006.01) G02B 5/18 (2006.01) G02B 6/12 (2006.01) G02B 6/124 (2006.01) G03F 7/00 (2006.01) G03F 7/039 (2006.01) G03F 7/075 (2006.01) G03F 7/36 (2006.01) G03H 1/02 (2006.01)

Patent

CA 2387716

A composition having a refractive index sensitively changeable by a radiation which comprises (A) a decomposable compound, (B) a non-decomposable compound having a refractive index lower than that of the decomposable compound (A), (C) a radiation-sensitive decomposing agent, and (D) a stabilizer. The irradiation of the composition with a radiation ray via a mask decomposes the above (C) and (A) components in a irradiated portion, resulting in the occurrence of the difference in refractive index between an irradiated portion and a non-irradiated portion, which leads to the formation of a pattern having regions of different refractive indexes.

Composition possédant un indice de réfraction sensiblement modifiable par rayonnement, qui comprend (A) un composé décomposable et (B) un composé non décomposable ayant un indice de réfraction inférieur à celui du composé décomposable (A), (C) un agent de décomposition sensible au rayonnement ainsi que (D) un stabilisateur. L'irradiation de la composition avec un rayon à travers un masque décompose les composés (A) et (C) dans la partie irradiée, ce qui fait apparaître une différence de l'indice de réfraction entre la partie irradiée et celle non irradiée, ce qui entraîne la formation d'un motif présentant des régions d'indices de réfraction différents.

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