C - Chemistry – Metallurgy – 02 – F
Patent
C - Chemistry, Metallurgy
02
F
C02F 1/32 (2006.01)
Patent
CA 2349199
A cleaning apparatus for a radiation source assembly (120) in a fluid treatment system is described. The cleaning system comprises: a cleaning sleeve (145) comprising a cleaning ring (150) for engagement with a portion of the exterior of the radiation source assembly (120); a slidable member (155) magnetically coupled to the cleaning sleeve, the slidable member being disposed on and slidable with respect to a rodless cylinder (140); and motive means to translate the slidable member along the rodless cylinder whereby the cleaning whereby the cleaning sleeve is translated over the exterior of the radiation source assembly. A radiation source module (100) comprising the cleaning apparatus is also disclosed. The radiation source module is particularly useful for ultraviolet radiation of wastewater while having the advantages of in situ cleaning of the radiation source as when it becomes fouled.
L'invention concerne un dispositif de nettoyage destiné à l'ensemble (120) source de rayonnement d'un système de traitement de fluide. Ledit dispositif de nettoyage comprend: un manchon (145) de nettoyage comprenant une bague (150) de nettoyage destinée à venir au contact d'une partie extérieure de l'ensemble (120) source de rayonnement; un élément (155) coulissant couplé magnétiquement au manchon de nettoyage, ledit élément coulissant étant disposé de manière à coulisser sur un cylindre (140) sans tige; et des moyens moteurs servant à imprimer un mouvement de translation à l'élément coulissant afin que celui-ci coulisse le long du cylindre sans tige, ce qui permet le déplacement du manchon de nettoyage sur l'extérieur de l'ensemble source de rayonnement. L'invention concerne également un module (100) de source de rayonnement comprenant ce dispositif de nettoyage. Ce module de source de rayonnement, particulièrement utile pour l'irradiation aux ultraviolets des eaux usées, présente l'avantage de permettre le nettoyage in situ de la source de rayonnement lorsque celle-ci s'encrasse.
Hesse Nicholas Helmut
Pearcey Richard
Sheculski Christopher Jeffery
Gowling Lafleur Henderson Llp
Trojan Technologies Inc.
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