C - Chemistry – Metallurgy – 09 – K
Patent
C - Chemistry, Metallurgy
09
K
31/84
C09K 11/04 (2006.01) G21F 9/02 (2006.01) G21H 1/00 (2006.01) G21H 5/00 (2006.01)
Patent
CA 1114148
RADIOACTIVE GAS ENCAPSULATED IN AMORPHOUS MATERIAL ABSTRACT OF THE DISCLOSURE Amorphous materials containing radioactive gas in the voids thereof are useful in such applications as in the control of radioactive gases and in fabricating controlled radioactive sources. The radioactive gas encapsulating material is formed under electrical stress that entraps approximately 30 atomic percent of the radioactive gas in the voids in the material.
292575
Cuomo Jerome J.
Gambino Richard J.
Van Vechten James A.
International Business Machines Corporation
Na
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