Rapid drying oven and methods for providing rapid drying of...

F - Mech Eng,Light,Heat,Weapons – 26 – B

Patent

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F26B 13/30 (2006.01) F26B 5/04 (2006.01) F26B 19/00 (2006.01) F26B 21/00 (2006.01) F26B 21/14 (2006.01) F26B 25/06 (2006.01)

Patent

CA 2304778

A dryer (10) for use with chemical compounds employs controlled vacuum, elevated temperature, and dry inert gas to dry the chemical compounds. The dryer includes a vacuum chamber into which trays (20) containing compounds are placed. The chamber includes heating elements which elevate the temperature of chemical samples placed within the chamber. Supplying and evacuating manifolds (24) each with a plurality of orifices for supplying, and evacuating dry inert gas, provide a substantially laminar flow of dry inert gas just above the trays of chemical compounds which are to be dried. The laminar gas flow removes the unwanted vapor which tends to form above the tray of chemical compound, thus accelerating the drying process.

L'invention concerne un séchoir (10) pour composés chimiques utilisant un vide d'air régulé, une température élevée et un gaz rare sec pour sécher les composés chimiques. Le séchoir comporte une chambre à vide dans laquelle on place des plateaux (20) comportant des composés. Cette chambre comprend des éléments de chauffage qui augmentent la température des échantillons chimiques placés dans la chambre. Des collecteurs (24) d'alimentation et d'évacuation, présentant chacun plusieurs orifices permettant d'alimenter et d'évacuer le gaz rare sec, assurent un écoulement sensiblement laminaire de gaz rare sec, juste au-dessus des plateaux de composés chimiques à sécher. L'écoulement gazeux laminaire élimine la vapeur indésirable qui tend à se former au-dessus du plateau de composés chimiques, accélérant ainsi le processus de séchage.

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