C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 5/00 (2006.01) C10L 1/14 (2006.01) C23C 16/18 (2006.01)
Patent
CA 2154456
The invention provides rare earth compound of formula [(ML3xA]y where M is one or more of the rare earth metals and yttrium, L is a beta-diketone type ligand, A is a polyether or polyamine, and x and y are each 1 or 2. These compounds are precursors for chemical vapour deposition (CVD) of oxide layers in applications such as superconductors, piezoelectrics, microwaves, fuel cells, radiation detectors, optoelectronics, and catalysts. They are air and moisture stable, low melting, vacuum volatile at low temperatures leaving minimum residue and give good quality metal oxide deposits uncontaminated by fluorine. These compounds also have excellent solubility in a wide range of organic solvents, and are potentially useful as oil lubricant additives and in fuels.
Drake Simon Robert
Leedham Timothy John
Mccarthy Tetrault Llp
Rhone-Poulenc Chimie
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