Reactive ion etching process

Details Reactive ion etching process Reactive ion etching process

C - Chemistry, Metallurgy

04

B

204/96.05

C04B 41/91 (2006.01) C04B 41/53 (2006.01) H01L 21/311 (2006.01)

Patent

CA 1222218

REACTIVE ION ETCHING PROCESS Abstract of the Disclosure In a process for etching by reactive ion etching, a ceramic partially masked by an organic photoresist, an etch gas containing SF6, a noble gas and a small percentage of a carbon-containing gas is used.

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