Reactive metal sources and deposition method for...

C - Chemistry – Metallurgy – 23 – C

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C23C 14/34 (2006.01) C09K 11/70 (2006.01) C23C 14/06 (2006.01)

Patent

CA 2554756

A physical vapour deposition method for the deposition of thioaluminate phosphor compositions comprises providing one or more source materials comprising an intermetallic barium aluminum compound, a barium aluminum alloy or a protected barium metal, providing an activator species and effecting deposition of the one or more source materials and activator species as a phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.

L'invention concerne un procédé de dépôt physique en phase vapeur pour le dépôt de compositions de phosphore à base de thioaluminate. Ce procédé consiste à prévoir un ou plusieurs matériaux sources comprenant un composé intermétallique de baryum et d'aluminium, et un alliage de baryum et d'aluminium ou un baryum métallique protégé, à prévoir une espèce d'activateur et à déposer le ou les matériaux sources et l'espèce d'activateur sous forme de composition phosphorée sur un substrat sélectionné. Ce procédé permet de déposer des phosphores électroluminescents bleus en couche mince, possédant une luminance élevée et les couleurs requises pour des applications télévisuelles.

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