C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 220/38 (2006.01) B41C 1/10 (2006.01) B41N 1/00 (2006.01) B41N 1/08 (2006.01) C08F 212/14 (2006.01) C08J 3/14 (2006.01) C08J 3/24 (2006.01) C08J 7/12 (2006.01) C09D 5/32 (2006.01) C09D 133/14 (2006.01)
Patent
CA 2661147
There is provided polymeric particles having a particle size between about 60 nm and about 1000 nm and comprising a polymer, the polymer comprising a hydrophobic backbone, a near infrared absorbing segment having attached thereto a near infrared absorbing chromophore having an absorption peak between about 700 nm and about 1100 nm; and a near infrared transparent segment. Method of manufacture these particles are also provided. A coating composition comprising the above-polymeric particles and a reactive iodonium oligomer is also provided. Finally, a negative-working lithographic offset printing plate comprising a substrate; a hydrophilic under layer; and a laser imageable upper layer, wherein the laser imageable upper layer comprises the above polymeric particle is also provided.
La présente invention concerne des particules polymères ayant une granulométrie allant d'environ 60 nm à environ 1000 nm et comprenant un polymère, le polymère comprenant un squelette hydrophobe, un segment absorbant le proche infrarouge auquel est attaché un chromophore absorbant le proche infrarouge présentant un pic d'absorption allant d'environ 700 nm à environ 1100 nm ; et un segment transparent en proche infrarouge. L'invention concerne également le procédé de fabrication de ces particules. L'invention concerne également une composition de revêtement comprenant les particules polymères ci-dessus et un oligomère d'iodonium réactif. Enfin, l'invention concerne également une plaque lithographique d'impression offset à copiage par inversion comprenant un substrat ; une couche inférieure hydrophile ; et une couche supérieure adaptée à l'imagerie laser, cette couche supérieure adaptée à l'imagerie laser, comprenant les particules polymères ci-dessus, étant également fournie par la présente invention.
Locas Marc-Andre
Nguyen My T.
American Dye Source Inc.
Goudreau Gage Dubuc
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