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C - Chemistry, Metallurgy

30

B

148/2.4

C30B 25/14 (2006.01) B01J 4/00 (2006.01) B01J 4/04 (2006.01) H01L 21/20 (2006.01)

Patent

CA 1332694

- 14 - ABSTRACT REAGENT SOURCE A method of providing a reagent into a chemical process said provision being in the vapour phase and at a controlled mass flow rate wherein the method comprises:- (a) providing a gas stream which contains a gaseous phase complexing agent for the reagent said complexing agent being provided at a controlled partial vapour pressure in said gas stream; (b) providing a primary source of the reagent in a reservoir which is connected to the gas stream via a diffusion path; (c) causing the gaseous phase complexing agent to diffuse into the reservoir at a mass flow rate controlled by its partial pressure in the gas stream; (d) causing the gaseous phase complexing agent in the reservoir to react with the primary source to generate a gaseous phase complex of the reagent and the gaseous phase complexing agent, said generation being, in the steady state, at. a rate equivalent to the rate of inflow of said complexing agent; (e) causing the gaseous phase complex to diffuse out of the reservoir into the gas stream at a rate, in the steady state, which is equivalent to its rate of generation in stage (d); whereby the mass flow of reagent occurs at a rate defined and controlled by the vapour pressure of the vapour phase complexing agent in the gas stream.

537210

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