C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/83 (2006.01) C11D 1/02 (2006.01) C11D 3/20 (2006.01) C11D 3/43 (2006.01) C11D 3/44 (2006.01) C11D 1/66 (2006.01)
Patent
CA 2294209
The invention provides an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, and the cleaner comprises: (a) an effective amount of a least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25 ~C, and mixtures of such solvents; (b) an effective amount of either at least one anionic surfactant, or a mixture of anionic and nonionic surfactants; (c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5; and (d) the remainder as substantially all water.
Nettoyant aqueux pour surfaces dures, présentant un pouvoir d'élimination sensiblement amélioré des résidus ainsi qu'une formation réduite de film/striures. Le nettoyant comprend: (a) une quantité efficace d'au moins un solvant organique présentant une pression de vapeur d'au moins 0,001 mm Hg à 25 ·C et des mélanges de tels solvants; (b) une quantité efficace d'au moins un tensioactif anionique ou d'un mélange de tensioactifs anioniques et non ioniques; (c) une quantité efficace d'un système tampon comprenant un tampon azoté produisant un pH supérieur à 6,5; et (d) le solde étant composé principalement d'eau.
Riches Mckenzie & Herbert Llp
The Clorox Company
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