Reduced residue hard surface cleaner

Details Reduced residue hard surface cleaner Reduced residue hard surface cleaner

C - Chemistry, Metallurgy

11

D

C11D 1/75 (2006.01) C11D 3/02 (2006.01) C11D 3/04 (2006.01) C11D 3/10 (2006.01) C11D 3/20 (2006.01) C11D 3/44 (2006.01)

Patent

CA 2216235

The invention provides an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising: (a) an effective amount of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25°, and mixtures of such solvents; (b) an effective amount of at least one semi-polar nonionic surfactant, said surfactant having structure (I) wherein R1 is C5-20 alkyl, R2 and R3 are both Cl-4 alkyl, (a), or -(CH2) p-OH, although R2 and R3 do not have to be equal, and n is 1-5, and p is 1-6; (c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5; and (d) the remainder as substantially all water.

Cette invention concerne un produit aqueux destiné aux nettoyage de surfaces dures, permettant de beaucoup mieux enlever les résidus et de limiter sensiblement la formation de pellicules et de rayures. Ce produit comprend: (a) une quantité suffisante pour être efficace d'au moins un solvant organique sous une pression de vapeur d'au moins 0,001 mm de mercure à 25 DEG C, ainsi que des mélanges de ces solvants; (b) une quantité suffisante pour être efficace d'au moins un agent tensioactif non ionique et semi-polaire possédant la structure (I) où R<1> est un alkyle C5-20, R<2> et R<3> sont tous deux un alkyle C1-4, (a), ou -(CH2)p-OH, R<2> et R<3> ne devant pas forcément être égaux, n est compris entre 1 et 5 et p est compris entre 1 et 6; (c) une quantité suffisante pour être efficace d'un système tampon comprenant un tampon azoté qui permet d'obtenir un pH supérieur à 6,5; (d) de l'eau, laquelle constitue essentiellement le reste du produit.

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