Reduced residue hard surface cleaner

Details Reduced residue hard surface cleaner Reduced residue hard surface cleaner

C - Chemistry, Metallurgy

11

D

C11D 1/83 (2006.01) C11D 1/37 (2006.01) C11D 3/20 (2006.01) C11D 3/28 (2006.01) C11D 3/32 (2006.01) C11D 3/43 (2006.01) C11D 3/44 (2006.01) C11D 17/04 (2006.01) C11D 1/14 (2006.01) C11D 1/24 (2006.01)

Patent

CA 2294215

The invention provides an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising: (a) an effective amount of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25 ~C, and mixtures of such solvents; (b) an effective amount of a mixture of anionic surfactants; (c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5; and (d) the remainder as substantially all water.

Nettoyant aqueux pour surfaces dures, présentant un pouvoir d'élimination des résidus nettement amélioré ainsi qu'une formation sensiblement réduite de film/rayures. Le nettoyant comprend: (a) une quantité efficace d'au moins un solvant organique ayant une pression de vapeur d'au moins 0,001 mm Hg à 25 ·C, et de mélanges de tels solvants; (b) une quantité efficace d'un mélange de tensioactifs anioniques; (c) une quantité efficace d'un système tampon comprenant un tampon azoté et donnant un pH supérieur à 6,5; et (d) le solde composé principalement d'eau.

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