C - Chemistry – Metallurgy – 04 – B
Patent
C - Chemistry, Metallurgy
04
B
117/157, 117/86
C04B 41/87 (2006.01) B32B 18/00 (2006.01) C04B 35/80 (2006.01) C04B 35/83 (2006.01) C04B 41/45 (2006.01) C04B 41/52 (2006.01) C04B 41/81 (2006.01) C04B 41/89 (2006.01)
Patent
CA 1286549
REFRACTORY COMPOSITE MATERIAL AND METHOD OF PRODUCING MATERIAL Abstract of the Disclosure A porous substrate pervious to oxygen has a first coefficient of thermal expansion. The substrate may be formed from a plurality of discrete elements defining interstices. A matrix is disposed on the substrate without any chemical bond to the substrate. The matrix has a second coefficient of thermal expansion different from the first coefficient of thermal expansion and is free to move relative to the substrate with changes in temperature. The matrix may constitute a non-stoichiometric compound formed from a metal and a material providing negatively charged ions. The excess from the stoichiometric ratio in the amount of the metal or the material providing the negatively charged ion controls the properties of the matrix. The relative amount of the excess of the metal or the material providing the negatively charged ions from the stoichiometric ratio may be varied at different thicknesses of the matrix to vary the properties of the matrix at the different thicknesses. The matrix may have microscopic cracks in its periphery. A porous impervious to oxygen coating may be disposed on the matrix and may be provided with substantially the second coefficient of thermal expansion. The coating covers the microscopic cracks and is instrumental in preventing the matrix from oxidizing. A porous coating impervious to oxygen may also be disposed between the substrate and the matrix and may be provided with substantially the second coefficient of thermal expansion. This coating prevents the substrate from oxidizing. The different coatings or layers may be formed by a continuous process or by cyclic or pulsing techniques.
506796
Borden Ladner Gervais Llp
Refractory Composites Inc.
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