Regionally thinned microstructures for microbolometers

G - Physics – 01 – J

Patent

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G01J 5/20 (2006.01) H01L 29/12 (2006.01) H01L 49/02 (2006.01)

Patent

CA 2556511

Microbolometers with regionally thinned microbridges are produced by depositing a thin film (0.6 µm) of silicon nitride on a silicon substrate, forming microbridges on the substrate, etching the thin film to define windows in a pixel area, thinning the windows, releasing the silicon nitride, depositing a conductive YBaCuO film on the bridges, depositing a conductive film (Au) on the YBaCuO film, and removing selected areas of the YBaCuO and conductive films.

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