G - Physics – 03 – F
Patent
G - Physics
03
F
96/247
G03F 9/00 (2006.01) B32B 37/24 (2006.01) G03F 7/16 (2006.01) G03F 7/20 (2006.01) H05K 3/00 (2006.01)
Patent
CA 1247443
TITLE REGISTERING AND EXPOSING SHEET SUBSTRATES USING PHOTOSENSITIVE LIQUID ABSTRACT OF THE DISCLOSURE A process of imagewise exposure to actinic radiation of a photosensitive layer applied to a sheet substrate with registration of a photomask to the substrate is disclosed. The process comprises the steps of: (1) advancing a substrate to a position in a device to undertake in either order or concurrently (a) aligning the substrate and a photomask in a predetermined relationship; (b) applying a photosensitive liquid to between the substrate and the photomask; (2) contacting through the photosensitive liquid the substrate and the photomask such that during the contacting the substrate and the photomask remain in a fixed position relative to one another; (3) exposing the photosensitive liquid to actinic radiation through the photomask; (4) removing the photomask from the substrate whereby substantially no hardened material resulting from the photosensitive liquid remains on the photomask; and (5) obtaining a substrate containing discrete portions of bonded hardened material resulting from the photosensitive liquid.
430016
E. I. Du Pont de Nemours And Company
Mccallum Brooks & Co.
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